XJP-158J Metallurgical microscope is developed and aimed at the semiconductor industry, wafer manufacturing, electronic information industry, metallurgical industry, Used as an advanced Metallurgical microscope, the user can experience its superb performance when using it. It can be widely used to identify and analyze Semiconductor, FPD, Circuit encapsulation, the circuit substrate, Material, Casting/Metal/Ceramic parts, Precision molds. This instrument adopts both reflecting and transmitted illumination, Bright＆Dark field, DIC and Polarizing observation can proceed under reflecting illumination, and the Bright field observation is done under transmitted light. High quality and reliable optical system brings much clearer and sharper image. The design meets with the ergonomics needs and makes you feel comfortable and relaxed in doing your job.
Compensation Free Trinocular Head, Inclined 30°（50mm-75mm）
WF10×/20mm,crosshair with reticule 0.1mm
Long working distance bright＆dark field Infinity.Plan Objectives:
With DIC Jack Quadruple Nosepiece
Double layer mechanical stage
Stage Size: 189mm×160mm
Flashboard type Filters (green,blue,neutral)
N.A.1.25 Abbe Condenser with iris diaphragm and filter
Coaxial coarse ＆fine focusing adjustment with rack and pinion mechanism.Fine
focusing scale value 0.002mm
Transmission Illumination: Halogen Bulb 12V/50W, AC85V-230V, Brightness Adjustable
Epi-illumination: With aperture iris diaphragm and field iris diaphragm, halogen
Bulb 12V/50W, AC85V-230V, Brightness Adjustable
Analyzer 360°rotatable, both Polarizer and Analyzer can be moved out of the light path
Two-dimensional measure software
Professional metallurgical image analysis software
Epi-illumination:Halogen Bulb 12V/100W,AC85V-230V, Brightness Adjustable
Long working distance bright ＆ dark field Infinite Plan objectives:
1.3Mega、2.0 Mega、3.0 Mega,5.0 Megapixels CMOS Digital camera eyepieces
Photography attachment and CCD Adapter 0.5×、0.57×、0.75×
CCD Camera,colour 1/3″High resolution 520 TV lines
1.Adopt US High-1. 1.Adopt UIS High-resolution, long working distance, and infinity light path correcting system objective imaging technology
2.Extending the multiplexing technology of objective, compatible infinity objective with all the observation methods, including bright＆dark field observation, polarization, and DIC also provide with high clear and sharp image in each observation method.
3.Aspherical surface Kohler illumination, increasing the viewing brightness.
4. WF10×（Φ25）Super wide viewing field Eyepiece, long working distance metallurgical objective with bright and dark field
5.The Nosepiece can be equipped with detachable DIC differential interference device.