Description

JP-607A industrial microscope is developed and aimed at the semiconductor industry, wafer manufacturing, electronic information industry, metallurgical industry. Used as an advanced microscope, the user can experience its super performance when using it. It can be widely used to identify and analyze Semiconductor, FPD, Circuit encapsulation, the circuit substrate, Material, Casting/Metal/Ceramic parts, Precision molds and observe thicker specimen. High quality and reliable optical system bring much clearer and contrast image. The design meets the ergonomics needs and makes you feel comfortable and relaxed in doing your job.

Specification
Viewing Head
Compensation Free Trinocular Head, Inclined 30°(50mm-75mm)
Eyepiece
WF10×/25mm
WF10×/20mm,crosshair with reticule 0.1mm
Objective
Long working distance Infinite Plan Apochromatic objectives:5
×/0.15/W.D.35mm、10×/0.28/W.D.35mm、20×/0.40/W.D.20mm、50
×/0.55/W.D.13mm
Nosepiece
Quadruple nosepiece with center adjustable
Stage
Double layer mechanical stage
Stage Size: 190mm×140mm
Moving Range:50mm×40mm
Filter
Flashboard type Filters:(green,blue,neutral)
Focusing
Coaxial coarse &fine focusing adjustment with rack and pinion mechanism.Fine
focusing scale value 0.002mm
Light Source
With aperture iris diaphragm and field iris diaphragm, halogen bulb 12V/50W, AC
85V-230V, brightness adjustable
Polarizing Device
Analyzer rotatable 360,°Polarizer&Analyzer can be moved in/out of the optical path
Checking Tool
0.01mm Micrometer
Optional Accessory
Two-dimensional measurement software
Professional metallurgical image analysis software
Micrometer eyepiece
1.3Mega、2.0 Mega、3.0 Mega,5.0 Megapixels CMOS. Digital camera eyepieces
Halogen Bulb 12V/100W
Precision Stage: X-Y moving range 25mm×25mm, Moving Precision<5um, Digital
handwheel Min.Value:0.1um,360°Rotatable disc
Photography attachment and CCD Adapter 0.5×、0.57×、0.75×
Objective: 2×
Planishing tool
CCD Camera,colour 1/3″High resolution 520 TV lines
Characteristics and description

1.Adopt UIS High-resolution, Long working distance, and infinity light path correcting system objective imaging technology. 2.Extending the multiplexing technology of objective, compatible infinity objective with all the observation methods. 3. Aspherical surface Kohler illumination, increasing the viewing brightness. 4. WF10×(Φ25)super wide viewing field Eyepiece. Micrometer Eyepiece is accessory for a variety of optical measuring instruments, when assembled on an appropriate optical instrument, it can be used for various measurements, such as measuring the holes′distance, width and length of the graduation scale and keyways, metal surface quality, spectrum bandwidth, the density of fiber fabric and the field specimens and so on, it can also measure the size of indentation and scratch as accessory of some microhardness tester.

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