Mini Ultrasonic Atomization CVD tube furnace (AACVD) 1200℃

NBD-AACVD1200-50TI Mini Ultrasonic Atomization CVD tube furnace (AACVD) 1200℃

This equipment is an aerosol assisted vapor deposition equipment – aacvd (using liquid / gas aerosol precursor grown on the substrate), for fuel cells, ZnO transparent conductive film.
The instrument consists of three main modules: small flow liquid high-precision transmission system, ultrasonic atomization system and 1200 ℃ tubular furnace.
This technology is suitable for the use of non-volatile precursors, and can be widely used in the preparation of nano materials, coating and composite of electrode materials.

Main features
* Liquid flow control system: intermediate high-precision transmission, small flow liquid high-precision transmission, flow range: 0.04 ~ 36ml / min;
* Atomization device: equipped with a 2.4MHz ultrasonic atomizer, which can atomize liquid into liquid particles and lead them into tubular furnace;
* Heating system (tube furnace can be customized): the maximum temperature can reach 1200 ℃;
* Speed range of high precision peristaltic pump: 0.1 · 100RPM, reversible forward and reverse, with full speed key, which can realize fast emptying and adding;
* The 2.4MHz ultrasonic atomizer can control the gas flow meter to realize the atomization outflow speed and continuous operation atomization.

Spec:

Model Max.Temp Common Temp Heating zone (mm) Max speed of temp rising Resolution  of peristaltic  pump Power Weight Kg(≈)
NBD-AACVD1200-50TI 1200℃ 1150℃ 200mm ≤ 20℃/min 0.1rpm AC220V
1.2kw
30
* If special standard, please contact us at once
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